Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films

Published 2008 View Full Article

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Title
Impact of Kr gas mixing in oxygen plasma etching of ferroelectric poly(vinylidene fluoride-trifluoroethylene) copolymer films
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 16, Pages 162904
Publisher
AIP Publishing
Online
2008-10-25
DOI
10.1063/1.2970085
References
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