4.6 Article

Band gap engineering for La aluminate dielectrics on Si (100)

Journal

APPLIED PHYSICS LETTERS
Volume 93, Issue 5, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.2964181

Keywords

-

Ask authors/readers for more resources

La aluminate (La2O3)(x)(Al2O3)(1-x) films were grown by atomic layer deposition method, for which the conduction band offset, valence band offset, and band gap were obtained by using x-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The valence band offsets were nearly unchanged within the range from 2.23 to 2.37 eV with increasing Al content. The conduction band offsets were changed from 2.40 to 2.86 eV for the above dielectrics. Remarkably, the band gap could be engineered from 5.75 to 6.35 eV by increasing Al content. We also found that La aluminate films have symmetric band profiles.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available