4.5 Article

Novel SIMS system with focused massive cluster ion source for mass imaging spectrometry with high lateral resolution

Journal

APPLIED PHYSICS EXPRESS
Volume 7, Issue 5, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.7567/APEX.7.056602

Keywords

-

Funding

  1. JST, CREST
  2. Japan Society for the Promotion of Science (JSPS) [25-2001]

Ask authors/readers for more resources

Recent developments in cluster ion beams for secondary ion mass spectrometry (SIMS) have enabled the realization of molecular depth profiling and mass imaging of organic and biological materials. Massive Ar cluster beams present reduced surface damage and fragmented ion generation and are suitable as primary beams for SIMS. We recently obtained a finely focused massive 1.2-mu m-diameter cluster ion beam and combined it with an orthogonal acceleration time-of-flight mass spectrometer. A mesh pattern of a phospholipid thin film was clearly reproduced in the mass images of molecular ions with a measurement time of 100 s. (C) 2014 The Japan Society of Applied Physics

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.5
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

Article Physics, Applied

Angled etching of Si by ClF3-Ar gas cluster injection

Toshio Seki, Hiroki Yamamoto, Takahiro Kozawa, Tadashi Shojo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo

JAPANESE JOURNAL OF APPLIED PHYSICS (2017)

Article Physics, Atomic, Molecular & Chemical

Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS

Prutchayawoot Thopan, Hubert Gnaser, Rika Oki, Takaaki Aoki, Toshio Seki, Jiro Matsuo

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY (2018)

Article Instruments & Instrumentation

Gas cooling secondary ions emitted by gas cluster ion beam at the travelling wave ion guide of a Q-ToF-SIMS system

P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2019)

Article Instruments & Instrumentation

Cluster ion beam bombardment and Q-ToF-SIMS analysis of large biomolecules

P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2019)

Article Chemistry, Multidisciplinary

Selective Reduction Mechanism of Graphene Oxide Driven by the Photon Mode versus the Thermal Mode

Masaki Hada, Kiyoshi Miyata, Satoshi Ohmura, Yusuke Arashida, Kohei Ichiyanagi, Ikufumi Katayama, Takayuki Suzuki, Wang Chen, Shota Mizote, Takayoshi Sawa, Takayoshi Yokoya, Toshio Seki, Jiro Matsuo, Tomoharu Tokunaga, Chihiro Itoh, Kenji Tsuruta, Ryo Fukaya, Shunsuke Nozawa, Shin-ichi Adachi, Jun Takeda, Ken Onda, Shin-ya Koshihara, Yasuhiko Hayashi, Yuta Nishina

ACS NANO (2019)

Article Instruments & Instrumentation

MeV-SIMS measurement of lithium-containing electrolyte

Toshio Seki, Tomoya Nonomura, Takaaki Aoki, Jiro Matsuo

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2020)

Article Chemistry, Physical

Phonon transport probed at carbon nanotube yarn/sheet boundaries by ultrafast structural dynamics

Masaki Hada, Kotaro Makino, Hirotaka Inoue, Taisuke Hasegawa, Hideki Masuda, Hiroo Suzuki, Keiichi Shirasu, Tomohiro Nakagawa, Toshio Seki, Jiro Matsuo, Takeshi Nishikawa, Yoshifumi Yamashita, Shin-ya Koshihara, Vlad Stolojan, S. Ravi P. Silva, Jun-ichi Fujita, Yasuhiko Hayashi, Satoshi Maeda, Muneaki Hase

CARBON (2020)

Article Physics, Applied

High aspect (>20) etching with reactive gas cluster injection

Toshio Seki, Hiroki Yamamoto, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo

Summary: The reactive gas cluster injection process is a plasma-free etching method that avoids damage. The study shows a relationship between etching conditions and the aspect ratio, and an equation for predicting the maximum aspect ratio.

JAPANESE JOURNAL OF APPLIED PHYSICS (2022)

Article Engineering, Electrical & Electronic

Secondary ion mass spectrometry measurements under ambient and humid conditions using MeV ions

Toshio Seki, Kenta Ishii, Takaaki Aoki, Jiro Matsuo

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2020)

Article Engineering, Electrical & Electronic

In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment

Hubert Gnaser, Wolfgang Bock, Jiro Matsuo

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2018)

Article Physics, Applied

Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection

T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, J. Matsuo

APPLIED PHYSICS LETTERS (2017)

Proceedings Paper Computer Science, Information Systems

Development and Deployment of Research Data Preservation Policy at a Japanese Research University in 2016

Takaaki Aoki, Shoji Kajita, Hirokazu Akasaka, Hagane Takeda

2017 6TH IIAI INTERNATIONAL CONGRESS ON ADVANCED APPLIED INFORMATICS (IIAI-AAI) (2017)

No Data Available