Hydrogenated amorphous carbon thin films deposited by plasma-assisted chemical vapor deposition enhanced by electrostatic confinement: structure, properties, and modeling

Published 2014 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Hydrogenated amorphous carbon thin films deposited by plasma-assisted chemical vapor deposition enhanced by electrostatic confinement: structure, properties, and modeling
Authors
Keywords
Hydrogen Content, Rutherford Backscattering Spectrometry, Thin Film Deposition, Hardness Behavior, Elastic Recoil Detection Analysis
Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 117, Issue 3, Pages 1217-1225
Publisher
Springer Nature
Online
2014-08-20
DOI
10.1007/s00339-014-8510-4
References
View 5 related references

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.