Zr-induced structural changes in Hf1−x Zr x O2 high-k thin films

Published 2013 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Zr-induced structural changes in Hf1−x Zr x O2 high-k thin films
Authors
Keywords
HfO2, Tetragonal Symmetry, National Synchrotron Light Source, Metal Oxide Semiconductor Field Effect, HfO2 Thin Film
Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 117, Issue 1, Pages 93-96
Publisher
Springer Nature
Online
2013-12-22
DOI
10.1007/s00339-013-8208-z
References
View 2 related references

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.