The effects of a thin film dopant precursor on the structure and properties of femtosecond-laser irradiated silicon

Published 2011 View Full Article

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Title
The effects of a thin film dopant precursor on the structure and properties of femtosecond-laser irradiated silicon
Authors
Keywords
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Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 105, Issue 4, Pages 795-800
Publisher
Springer Nature
Online
2011-10-27
DOI
10.1007/s00339-011-6651-2
References
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