Antimicrobial Potential of Copper-Containing Titanium Surfaces Generated by Ion Implantation and Dual High Power Impulse Magnetron Sputtering

Stability, Antimicrobial Activity, and Cytotoxicity of Poly(amidoamine) Dendrimers on Titanium Substrates

(2011) Lin Wang et al.   ACS Applied Materials & Interfaces

Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µs

(2011) V. Stranak et al.   CONTRIBUTIONS TO PLASMA PHYSICS

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

(2011) V. Stranak et al.   EUROPEAN PHYSICAL JOURNAL D

Antibacterial efficacy of a new gentamicin-coating for cementless prostheses compared to gentamicin-loaded bone cement

(2011) Daniëlle Neut et al.   JOURNAL OF ORTHOPAEDIC RESEARCH

Decreasing Bacterial Colonization of External Fixation Pins Through Nitric Oxide Release Coatings

(2011) Joshua Holt et al.   JOURNAL OF ORTHOPAEDIC TRAUMA

Deposition of thin titanium–copper films with antimicrobial effect by advanced magnetron sputtering methods

(2011) V. Stranak et al.   Materials Science & Engineering C-Materials for Biological Applications

Oxygen and Water Plasma-Immersion Ion Implantation of Copper into Titanium for Antibacterial Surfaces of Medical Implants

(2010) Martin Polak et al.   ADVANCED ENGINEERING MATERIALS

Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films

(2010) Vitezslav Stranak et al.   JOURNAL OF APPLIED PHYSICS

Prevention of pin tract infection with titanium-copper alloys

(2009) Toshiharu Shirai et al.   JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART B-APPLIED BIOMATERIALS

Applications of plasma-based technology to microelectronics and biomedical engineering

(2009) Paul K. Chu   SURFACE & COATINGS TECHNOLOGY

Plasma Drift in Dual Magnetron Discharge

(2008) Pavel Baroch et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Formation of TiOx films produced by high-power pulsed magnetron sputtering

(2008) Vítězslav Straňák et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS