Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition

Title
Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
Authors
Keywords
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Journal
ACS Applied Materials & Interfaces
Volume 6, Issue 9, Pages 6731-6738
Publisher
American Chemical Society (ACS)
Online
2014-04-09
DOI
10.1021/am500458d

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