Integration of TmSiO/HfO2 Dielectric Stack in Sub-nm EOT High-k/Metal Gate CMOS Technology

Published 2015 View Full Article

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Title
Integration of TmSiO/HfO2 Dielectric Stack in Sub-nm EOT High-k/Metal Gate CMOS Technology
Authors
Keywords
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Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 62, Issue 3, Pages 934-939
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2015-02-05
DOI
10.1109/ted.2015.2391179

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