Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering

Title
Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering
Authors
Keywords
-
Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 76, Issue -, Pages 80-86
Publisher
Elsevier BV
Online
2018-01-09
DOI
10.1016/j.mssp.2018.01.001

Ask authors/readers for more resources

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now