Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering
Influence of substrate bias voltage on crystallographic structure, optical and electronic properties of Al/(Ta 2 O 5 ) 0.85 (TiO 2 ) 0.15 /p-Si MIS Schottky barrier diodes fabricated by dc magnetron sputtering
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