4.6 Article

Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength

Journal

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
Volume 85, Issue 3, Pages 703-711

Publisher

SPRINGER
DOI: 10.1007/s10971-018-4582-5

Keywords

Periodic mesoporous organosilica; Low electric constant; Mechanical property; Thin film

Funding

  1. National Natural Science Foundation of China [21201175, 61505123, 21601065]
  2. NSFC-Guangdong [U1601202]
  3. NSFC-Shenzhen [U1613215]
  4. Guangdong and Shenzhen Innovative Research Team Program [2011D052, KYPT20121228160843692]
  5. Key Laboratory of Guangdong Province [2014B030301014]
  6. R&D Funds for basic Research Program of Shenzhen [JCYJ20120615140007998, 20150401145529012, 20150525092940976]
  7. Shenzhen Fundamental Research Program [JCYJ20160331191741738, JSGG20160229194437896]

Ask authors/readers for more resources

In this work, a novel bridged organosilane precursor, adamantane-bridged organosilane (ADBO), was synthesized successfully which was employed to prepare adamantane-based (ADH-based) periodic mesoporous organosilica (PMO) thin film in the presence of porogen and acid catalyst via evaporation-induced self-assembly (EISA) after spin-coating procedure. The resultant ADH-based PMO thin films were characterized by FTIR, NMR, TEM, and small-angle XRD. The ADH-based PMO thin film with weight ratio of porogen to ADBO (0.75:1) possesses low dielectric constant (1.55 +/- 0.04@1 MHz), excellent Young's modulus (6.69 +/- 0.54 GPa), and ideal hydrophobic property (90.2A degrees of water contact angle) simultaneously. These outstanding properties of ADH-based PMO film can be ascribed to lower polarity, lower density, and rigid cavity structure of adamantane, which suggests its potential application as high-performance low-kappa material in next-generation microelectronics. [GRAPHICS] .

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