Journal
IEEE ELECTRON DEVICE LETTERS
Volume 39, Issue 5, Pages 769-772Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2018.2820841
Keywords
Molecular doping; black phosphorus; contact resistance; transistors
Categories
Funding
- National Natural Science Foundation of China [61574066, 61390504]
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Achieving low contact resistance is one of the main challenges for black phosphorus (BP) transistors for both electronic and optoelectronic applications. Here we demonstrate a novel yet feasible lithium doping technique, which greatly reduces the contact resistance from 2 to 0.85 k Omega center dot mu m and results in more than 2.5 times improvement in output current and ON/OFF ratio. This can be mainly attributed to the high hole doping density by lithium bis(trifluoromethylsulfonyl)-imide, which results in a narrower carrier injection barrier at the source end. The ON/OFF ratios of BP field-effect transistors with contact doping at 300 and 20 K are 432 and 7.2x10(5), respectively. A high drain current of 773 mu A/mu m with a 0.56 mu m channel length at 20 K is also demonstrated. The doping technique provides a valid way to improve the overall performance of BP transistors.
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