Microstructure of gas flow sputtered thermal barrier coatings: Influence of bias voltage

Published 2017 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Microstructure of gas flow sputtered thermal barrier coatings: Influence of bias voltage
Authors
Keywords
Gas flow sputtering, Reactive sputtering, Yttria stabilized zirconia, Thermal barrier coatings, Substrate temperature, Bias voltage, Morphology, Microstructure, Grain orientation
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 332, Issue -, Pages 22-29
Publisher
Elsevier BV
Online
2017-09-29
DOI
10.1016/j.surfcoat.2017.09.067

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.