Journal
SMALL
Volume 13, Issue 43, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201702003
Keywords
nanofabrication; polymer brush; scanning probe lithography; solar cells; transparent conductive electrodes
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Funding
- Hong Kong Polytechnic University [1ZE27, 4-BCBM]
- General Research Fund of Hong Kong [PolyU 153202/16P]
- AFOSR [FA9550-16-1-0150]
- National Science Foundation [DBI-1353682]
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Au nanostructures are remarkably important in a wide variety of fields for decades. The fabrication of Au nanostructures typically requires time-consuming and expensive electron-beam lithography (EBL) that operates in vacuum. To address this challenge, this paper reports the development of massive dippen nanodisplacement lithography (DNL) as a desktop fabrication tool, which allows high-throughput and rational design of arbitrary Au nanopatterns in ambient condition. Large-area (1 cm(2)) and uniform (<10% variation) Au nanostructures as small as 70 nm are readily fabricated, with a throughput 100-fold higher than that of conventional EBL. As a proof-of-concept of the applications in the opitcal field, we fabricate discrete Au nanorod arrays that show significant plasmonic resonance in the visible range, and interconnected Au nanomeshes that are used for transparent conductive electrode of solar cells.
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