4.8 Article

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Journal

SMALL
Volume 13, Issue 17, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201603939

Keywords

-

Funding

  1. National Creative Research Initiative (CRI) Center for Multi-Dimensional Directed Nanoscale Assembly [2015R1A3A2033061]
  2. Global Frontier Hybrid Interface Materials (GFHIM) of the National Research Foundation of Korea (NRF) - Ministry of Science, ICT & Future Planning [2013M3A6B1078874]
  3. National Research Foundation of Korea (NRF) - Ministry of Science, ICT & Future Planning [NRF-2016M3A7B4905624]
  4. National Research Foundation of Korea [2016M3A7B4905613, 2015R1A3A2033061] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Spatial arrangement of 1D nanomcrterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion. loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area-selective localized replacement of metal ions in the self-assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions.

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