4.8 Article

Organic Ice Resists

Journal

NANO LETTERS
Volume 17, Issue 12, Pages 7886-7891

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b04190

Keywords

Electron-beam lithography; condensed organic molecules; ice lithography; focused electron-beam induced deposition; 3D lithography; nanostructured diamond

Funding

  1. VILLUM foundation

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Electron-beam lithography (EBL) is the backbone technology for patterning nanostructures and manufacturing nano devices. It involves processing and handling synthetic resins in several steps, each requiring optimization and dedicated instrumentation in cleanroom environments. Here, we show that simple organic molecules, e.g. alcohols, condensed to form thin-films at low temperature demonstrate resist-like capabilities for EBL applications and beyond. The entire lithographic process takes place in a single instrument, and avoids exposing users to chemicals and the need of cleanrooms. Unlike EBL that requires large samples with optically flat surfaces, we patterned on fragile membranes only 5 nm-thin, and 2 X 2 mm(2) diamond samples. We created patterns on the nanometer to sub-millimeter scale, as well as three-dimensional structures by stacking layers of frozen organic molecules. Finally, using plasma etching, the organic ice resist (OIR) patterns are used to structure the underlying material, and thus enable nanodevice fabrication.

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