Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions

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Title
Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 35, Issue 1, Pages 01B101
Publisher
American Vacuum Society
Online
2016-10-01
DOI
10.1116/1.4963368

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