Using deposition rate to increase the thermal and kinetic stability of vapor-deposited hole transport layer glasses via a simple sublimation apparatus
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Title
Using deposition rate to increase the thermal and kinetic stability of vapor-deposited hole transport layer glasses via a simple sublimation apparatus
Authors
Keywords
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Journal
JOURNAL OF CHEMICAL PHYSICS
Volume 146, Issue 20, Pages 203328
Publisher
AIP Publishing
Online
2017-04-07
DOI
10.1063/1.4979814
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