Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 694, Issue -, Pages 647-652Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2016.10.046
Keywords
Germanium carbon; Magnetron co-sputtering; Structural disorder degree; Optical properties; Electrical resistivity
Categories
Funding
- Aviation Science Fund [2015ZF53073]
- Open Research Fund of State Key Laboratory of Transient Optics and Photonics, Chinese Academy of Sciences [SKLST201503]
- Fund of the State Key Laboratory of Solidification Processing (NWPU), China [110-QP-2014]
- 111 Project [B08040]
Ask authors/readers for more resources
Hydrogenated amorphous germanium carbon (a-Gei(1-x)C(x):H) films were deposited by using magnetron co-sputtering starting from a mixed target of germanium and graphite in Ar and H-2 mixture atmosphere. The structural, bonding, optical and electrical properties of the films were investigated as functions of H-2 flow rate with the C and Ge contents in the films respectively kept constant. Both electrical resistivity and optical band gap of the a-Gei(1-x)C(x):H films increased with increasing H-2 flow rate from 0 to 15 sccm, while the refractive index stayed around 3.6. X-ray diffraction patterns and Raman spectra confirmed that the structural disorder degree of the a-Ge1-xCx:H films had declined with the rise in H-2 flow rate. The results of X-ray photoelectron spectroscopy showed that the formation of sp(3) hybridized C and C-Ge bonds in the films had been promoted by incorporation of hydrogen into the films. The relations between the chemical bonding and the structural, optical and electrical properties of the films were discussed. (C) 2016 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available