Experimental and DFT study of nitrogen atoms interactions with SiOCH low-κ films

Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOxfilms

(2016) Yuri A Mankelevich et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Interaction of F atoms with SiOCH ultra-low-kfilms: I. Fluorination and damage

(2015) T V Rakhimova et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Interaction of F atoms with SiOCH ultra low-k films. Part II: etching

(2015) T V Rakhimova et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Growth-rate Enhancement of High-quality, Low-loss CVD-produced Diamond Disks Grown for Microwave Windows Application

(2013) Sergey Bogdanov et al.   CHEMICAL VAPOR DEPOSITION

Plasma processing of low-k dielectrics

(2013) Mikhail R. Baklanov et al.   JOURNAL OF APPLIED PHYSICS

Elementary reactions of N atoms with hydrocarbons: first steps towards the formation of prebiotic N-containing molecules in planetary atmospheres

(2012) Nadia Balucani   CHEMICAL SOCIETY REVIEWS

Chemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy

(2011) Hiroshi Yamamoto et al.   JOURNAL OF APPLIED PHYSICS

The mechanism of low-k SiOCH film modification by oxygen atoms

(2010) O. V. Braginsky et al.   JOURNAL OF APPLIED PHYSICS

Combined Crossed Molecular Beam and Theoretical Studies of the N(2D) + CH4Reaction and Implications for Atmospheric Models of Titan†

(2009) Nadia Balucani et al.   JOURNAL OF PHYSICAL CHEMISTRY A