Dry etching and residue removal of functional polymer mixed with TiO2 microparticles via inductively coupled CF4/O2 plasma and ultrasonic-treated acetone for humidity sensor application

Title
Dry etching and residue removal of functional polymer mixed with TiO2 microparticles via inductively coupled CF4/O2 plasma and ultrasonic-treated acetone for humidity sensor application
Authors
Keywords
-
Journal
RSC Advances
Volume 6, Issue 47, Pages 41580-41586
Publisher
Royal Society of Chemistry (RSC)
Online
2016-04-27
DOI
10.1039/c6ra07688b

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