4.5 Article

Microstructure and micromorphology of ZnO thin films: Case study on Al doping and annealing effects

Journal

SUPERLATTICES AND MICROSTRUCTURES
Volume 93, Issue -, Pages 109-121

Publisher

ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2016.03.003

Keywords

AZO thin films; Radio frequency sputtering; AFM; Fractal analysis; Three-dimensional; Surface micromorphology

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The aim of this work is to investigate the three-dimensional (3-D) surface texture of Aliminium doped Zinc Oxide (AZO) thin films deposited by Radio Frequency sputtering method on the quartz substrates. Deposited samples were annealed under argon flux at three different temperatures: 400 degrees C, 500 degrees C, and 600 degrees C, followed by gradual cooling down to room temperature. To characterize the structure of samples X-ray diffraction (XRD) patterns and Rutherford Back Scattering (RBS) spectra were applied. The Scanning electron microscope (SEM) and the atomic force microscope (AFM) were applied to study the samples' surface morphology. Then statistical, fractal and functional surface characteristics were computed. The analysis of 3-D surface texture of AZO thin films is crucial to control the 3-D surface topography features and to correct interpretate the surface topographic parameters. It also allows understanding the relationship between 3-D the surface topography and the functional (physical, chemical and mechanical) properties of AZO thin films. (C) 2016 Elsevier Ltd. All rights reserved.

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