Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering

标题
Effect of deposition power and pressure on rate deposition and resistivity of titanium thin films grown by DC magnetron sputtering
作者
关键词
-
出版物
SPECTROSCOPY LETTERS
Volume 49, Issue 8, Pages 514-519
出版商
Informa UK Limited
发表日期
2016-07-23
DOI
10.1080/00387010.2016.1212244

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