Nanobowl array fabrication based on nanoimprint lithography

This paper presents a fabrication method of nanobowl array by combining polystyrenes spheres (PSs) self-assembly, nanoimprint lithography (NIL), and lift-off process. A self-assembly monolayer of PSs on the quartz wafer is used as the nanoimprint mold. After separating the mold, the residual PSs onto the nanoimprint resist can be lifted off in the hydrofluoric acid solution and the nanobowl array is achieved. The size of the nanobowl can be modulated by the thickness of the nanoimprint resist. Using this method, different size of nanobowl arrays with high-resolution nanogap and nanoholes were fabricated, which has great potential to serve as a reaction container, catalyst and surface enhanced Raman scattering substrate. (C) 2015 Elsevier GmbH. All rights reserved.