Journal
OPTIK
Volume 127, Issue 13, Pages 5383-5389Publisher
ELSEVIER GMBH
DOI: 10.1016/j.ijleo.2016.03.013
Keywords
RF magnetron sputtering; TiO2 thin films; Annealing effect; Optical properties; Optical band gap
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Titanium oxide thin films were synthesized through thermal oxidation of sputter deposited titanium layers on glass substrates. Transmittance spectra of UV vis analysis were utilized to calculate thickness, refractive index and extinction coefficient of the oxidized layers by using Swanepoel method. Optical parameters like; optical band gap energy E-g(opt), conductivity sigma(opt), dielectric constants epsilon(r), epsilon(i) and dissipation factor tan (delta); were also determined. AFM imaging of the as sputtered thin films showed that with increasing deposition time, surface roughness increases. Optical measurements indicate that transmittance decreases with increasing sputtering time in visible and infrared spectral range. (C) 2016 Published by Elsevier GmbH.
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