Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application

Published 2016 View Full Article

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Title
Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
Authors
Keywords
Thin film lithium niobate, Argon plasma etching, Ridge waveguides
Journal
OPTICAL MATERIALS
Volume 53, Issue -, Pages 1-5
Publisher
Elsevier BV
Online
2016-01-07
DOI
10.1016/j.optmat.2015.12.040

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