Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application

标题
Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
作者
关键词
Thin film lithium niobate, Argon plasma etching, Ridge waveguides
出版物
OPTICAL MATERIALS
Volume 53, Issue -, Pages 1-5
出版商
Elsevier BV
发表日期
2016-01-07
DOI
10.1016/j.optmat.2015.12.040

向作者/读者发起求助以获取更多资源

Reprint

联系作者

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started