High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
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Title
High aspect-ratio sub-500 nm UV-PDMS bilayer stamps by means of hybrid thermal-ultraviolet curing for resonant nanopillars fabrication through soft UV-NIL
Authors
Keywords
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Journal
MICROELECTRONIC ENGINEERING
Volume 282, Issue -, Pages 112088
Publisher
Elsevier BV
Online
2023-09-05
DOI
10.1016/j.mee.2023.112088
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