ASAP7: A 7-nm finFET predictive process design kit

Authors

Keywords

Predictive process design kit, 7-nm technology, Process scaling, Extreme ultraviolet lithography, Self-aligned multiple patterning, Design rules

Journal

MICROELECTRONICS JOURNAL

Volume 53, Issue -, Pages 105-115

Publisher

Elsevier BV

Online

2016-05-04

DOI

10.1016/j.mejo.2016.04.006

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started