ASAP7: A 7-nm finFET predictive process design kit

标题

作者

关键词

Predictive process design kit, 7-nm technology, Process scaling, Extreme ultraviolet lithography, Self-aligned multiple patterning, Design rules

出版物

Volume 53, Issue -, Pages 105-115

出版商

Elsevier BV

发表日期

2016-05-04

DOI

10.1016/j.mejo.2016.04.006

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