Self-Assembly of Oligosaccharide-b-PMMA Block Copolymer Systems: Glyco-Nanoparticles and Their Degradation under UV Exposure

This paper discusses the self-assembly of oligosaccharide-containing block copolymer and the use of ultraviolet (UV) to obtain nanoporous glyco-nanoparticles by photodegradation of the synthetic polymer block. Those glyco-nanoparticles consisting of oligosaccharide-based shell and a photodegradable core domain were Obtained from the self assembly of maltoheptaose-block-poly(methyl methacrylate) (MH-b-PMMA(48)) using the nanoprecipitation protocol. MH-b-PMMA(48) self-assembled into well-defined spherical micelles (major compound) with a hydrodynamic radius (R-h) of ca. 10 nm and also into large compound micellar aggregates (minor compound) with an R-h of ca. 65 nm. The oligosaccharide shells of these glyco-nanoparticles were cross-linked through the Michael-type addition of divinyl sulfone under dilute conditions to minimize the intermicellar cross-linking. The core domain photodegradation of the cross-linked glyco-nanoparticles was induced under exposure to 254 nm UV radiation, resulting in porous glyco-nanoparticles with an R-h of ca. 44 nm. The morphology of the cross-linked shell and the core photodegradation of these glyco-nanoparticles were characterized using static light scattering, dynamic light scattering, Fourier transform infrared spectroscopy, proton nuclear magnetic resonance, field-emission gun-scanning electron microscopy, and transmission electron microscopy. The innovative aspect of this approach concerns the fact that after removing the PMMA domains the porous nanoparticles are mostly composed of biocompatible and nontoxic oligosaccharides.