The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants

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Title
The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants
Authors
Keywords
D. ZnO, Atomic layer deposition (ALD), Hydrogen plasma
Journal
CERAMICS INTERNATIONAL
Volume 41, Issue 1, Pages 1839-1845
Publisher
Elsevier BV
Online
2014-10-08
DOI
10.1016/j.ceramint.2014.09.133

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