The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants

标题
The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants
作者
关键词
D. ZnO, Atomic layer deposition (ALD), Hydrogen plasma
出版物
CERAMICS INTERNATIONAL
Volume 41, Issue 1, Pages 1839-1845
出版商
Elsevier BV
发表日期
2014-10-08
DOI
10.1016/j.ceramint.2014.09.133

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