Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations

Published 2016 View Full Article

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Title
Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 120, Issue 49, Pages 28193-28203
Publisher
American Chemical Society (ACS)
Online
2016-11-12
DOI
10.1021/acs.jpcc.6b06347

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