Lithographic Multicolor Patterning on Hybrid Perovskites for Nano-Optoelectronic Applications

Ultrathin hybrid perovskites, with exotic properties and two-dimensional geometry, exhibit great potential in nanoscale optical and optoelectronic devices. However, it is still challenging for them to be compatible with high-resolution patterning technology toward miniaturization and integration applications, as they can be readily damaged by the organic solvents used in standard lithography processes. Here, a flexible three-step method is developed to make high-resolution multicolor patterning on hybrid perovskite, particularly achieved on a single nanosheet. The process includes first synthesis of precursor PbI2, then e-beam lithography and final conversion to target perovskite. The patterns with linewidth around 150 nm can be achieved, which can be applied in miniature optoelectronic devices and high-resolution displays. As an example, the channel length of perovskite photodetectors can be down to 126 nm. Through deterministic vapor-phase anion exchange, a perovskite nanosheet can not only gradually alter the color of the same pattern in a wide wavelength range, but also display different colors simultaneously. The authors are optimistic that the method can be applied for unlimited perovskite types and device configurations for their high-integrated miniature applications.

Automated summary

Ultrathin hybrid perovskites have great potential in nanoscale optical and optoelectronic devices, but their compatibility with high-resolution patterning technology has been challenging. In this study, a flexible three-step method is developed to achieve high-resolution multicolor patterning on a single nanosheet of hybrid perovskite. The method has the potential to be applied in miniature optoelectronic devices and high-resolution displays.