Hybrid Lithographic Arbitrary Patterning of TiO2 Nanorod Arrays

In this work, we report a hybrid lithographic method that combines the top-down soft lithography and the bottom-up hydrothermal approach for growing single-crystalline TiO2 nanorod arrays with arbitrary patterns. The arbitrary patterns of TiO2 seeds were obtained through the microcontact printing of the TiO2 seed precursor onto Si substrates using prepatterned poly(dimethylsiloxane) (PDMS) as stamps, followed by a baking process. Afterward, TiO2 nanorod arrays were selectively grown on patterned TiO2 seeds through conventional hydrothermal methods. By controlling the TiO2 seed precursor concentration, the hydrothermal reaction time and temperature and the patterns, the morphology and density of the TiO2 nanorods can be tuned in a controllable manner. Overall, this work provides a new strategy for the low-cost and facile preparation of patterned TiO2 nanorod arrays that has potential applications in micro-nano-optoelectronic devices and other fields.

Automated summary

This work presents a hybrid lithographic method for growing TiO2 nanorod arrays with arbitrary patterns. The method combines top-down soft lithography and bottom-up hydrothermal approach. The morphology and density of the nanorods can be controlled by adjusting the precursor concentration, reaction time, temperature, and patterns. The work provides a new strategy for the low-cost and facile preparation of patterned TiO2 nanorod arrays and has potential applications in micro-nano-optoelectronic devices and other fields.