Influence of pulsed-substrate bias duty cycle on the microstructure and defects of cathodic arc-deposited Ti1-xAlxN coatings

The influence of pulsed substrate bias duty cycle on the growth, microstructure, and defects of Ti1-xAlxN coatings grown by cathodic arc deposition was investigated. Ti1-xAlxN coatings of varying compositions (x = 0.56, 0.38, 0.23) were deposited on cemented carbide substrates with 10, 25, 50, and 95% duty cycles of 50 V pulsed-bias under 10 Pa of pure N-2 gas. Coatings grown at low duty cycles (10 and 25%) showed strongly textured, underdense coatings with facetted columns and low amount of lattice defects. Applying higher duty cycles (50 and 95%) produced coatings that have denser microstructures, less preferred orientation, increasing compressive stresses and increased lattice defect densities. Our study elucidates how duty cycle variation not only changes the overall average energy supplied at the growth front but also kinetically influences the coating growth and thus microstructure and defect structure.

Automated summary

The study found that the growth, microstructure, and defects of Ti1-xAlxN coatings are influenced by the pulsed substrate bias duty cycle. Coatings grown at low duty cycles exhibit loosely textured structures, while coatings grown at high duty cycles have denser microstructures.