Plasma-induced chemical etching generating Ni3S2 for formaldehyde detection
Published 2021 View Full Article
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Title
Plasma-induced chemical etching generating Ni3S2 for formaldehyde detection
Authors
Keywords
Chemical etching, Microplasma, Electrochemical detection, Formaldehyde
Journal
CHINESE CHEMICAL LETTERS
Volume -, Issue -, Pages -
Publisher
Elsevier BV
Online
2021-09-11
DOI
10.1016/j.cclet.2021.09.024
References
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