4.7 Article

Gate-tunable photodetector and ambipolar transistor implemented using a graphene/MoSe2 barristor

Journal

NPG ASIA MATERIALS
Volume 13, Issue 1, Pages -

Publisher

NATURE RESEARCH
DOI: 10.1038/s41427-021-00281-4

Keywords

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Funding

  1. National Research Foundation of Korea (NRF) - Korean government (MSIP) [2013R1A3A2042120]
  2. KIST Institutional Program [2E30410-20-085]

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The study introduces a graphene/MoSe2 barristor with a high on/off ratio and external quantum efficiency. By applying an electric field to the gate electrode, the photocurrent of the barristor can be modulated, resulting in a high gate tuning ratio.
Next-generation electronic and optoelectronic devices require a high-quality channel layer. Graphene is a good candidate because of its high carrier mobility and unique ambipolar transport characteristics. However, the on/off ratio and photoresponsivity of graphene are typically low. Transition metal dichalcogenides (e.g., MoSe2) are semiconductors with high photoresponsivity but lower mobility than that of graphene. Here, we propose a graphene/MoSe2 barristor with a high-k ion-gel gate dielectric. It shows a high on/off ratio (3.3x10(4)) and ambipolar behavior that is controlled by an external bias. The barristor exhibits very high external quantum efficiency (EQE, 66.3%) and photoresponsivity (285.0mA/W). We demonstrate that an electric field applied to the gate electrode substantially modulates the photocurrent of the barristor, resulting in a high gate tuning ratio (1.50 mu A/V). Therefore, this barristor shows potential for use as an ambipolar transistor with a high on/off ratio and a gate-tunable photodetector with a high EQE and responsivity.

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