4.8 Article

Single-Atom Quantum-Point Contact Switch Using Atomically Thin Hexagonal Boron Nitride

Journal

SMALL
Volume 17, Issue 7, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.202006760

Keywords

atomic contacts; atomic switch; defects; hBN; quantized conductance

Funding

  1. National Research Foundation of Korea (NRF) [2018R1A3B1052693]
  2. National Research Foundation of Korea [4199990514509] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The report introduces a quantized conductance atomic threshold switch (QCATS) using an atomically-thin hexagonal boron nitride (hBN) layer, which has applications in memory and logic devices. The device shows stable and reproducible conductance quantization state and operates by forming single-atom point contact through a monoatomic boron defect in the hBN layer. By implementing excellent switching characteristics with single-layer hBN, the possibility of stable and uniform atomic-switching devices for future memory and logic applications is confirmed.
The first report of a quantized conductance atomic threshold switch (QCATS) using an atomically-thin hexagonal boron nitride (hBN) layer is provided. This QCATS has applications in memory and logic devices. The QCATS device shows a stable and reproducible conductance quantization state at 1 center dot G(0) by forming single-atom point contact through a monoatomic boron defect in an hBN layer. An atomistic switching mechanism in hBN-QCATS is confirmed by in situ visualization of mono-atomic conductive filaments. Atomic defects in hBN are the key factor that affects the switching characteristic. The hBN-QCATS has excellent switching characteristics such as low operation voltage of 0.3 V, low off current of 1 pA, fast switching of 50 ns, and high endurance > 10(7) cycles. The variability of switching characteristics, which are the major problems of switching device, can be solved by reducing the area and thickness of the switching region to form single-atom point contact. The switching layer thickness is scaled down to the single-atom (approximate to 0.33 nm) h-BN layer, and the switching area is limited to single-atom defects. By implementing excellent switching characteristics using single-layer hBN, the possibility of implementing stable and uniform atomic-switching devices for future memory and logic applications is confirmed.

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