Deposition of thin films on glass fiber fabrics by atmospheric pressure plasma jet

Atmospheric pressure plasma jet is conducted to modify commercial glass fiber fabrics using methyltrimethoxysilane (MTMS) as precursor. An alternating current (AC) high voltage source is used to generate argon plasma jet for producing thin films containing silicon and oxygen on the fabric surfaces. The evolution of the prepared films is systematically investigated upon the variations of the precursor flow rate. The smooth surface is transformed into a rough surface with many particles, and the silicon containing functional groups increases with the precursor flow rate, resulting in a hydrophobic surface. Meanwhile, the excessive Si-CH3 functional groups also lead to a dramatic weight loss of the film during high temperature oxidization process. Taking the surface morphology, surface chemical structure and properties into consideration together, the appropriate precursor flow rate condition is found to be 20 ml/h. The optimal sample also presents an eximious ability to resist strong acid corrosion. The above results demonstrate a simple and feasible plasma deposition strategy to modify the surface of flexible materials controllably.