Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography

Published 2020 View Full Article

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Title
Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography
Authors
Keywords
-
Journal
Journal of Micro-Nanolithography MEMS and MOEMS
Volume 19, Issue 04, Pages -
Publisher
SPIE-Intl Soc Optical Eng
Online
2020-11-21
DOI
10.1117/1.jmm.19.4.043201
References
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