Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution

出版年份 2016 全文链接

标题

作者

关键词

Polishing, Diamond, Surface smoothing, OH radical, Chemical mechanical polishing, Tribochemical

出版物

Volume 70, Issue -, Pages 39-45

出版商

Elsevier BV

发表日期

2016-10-01

DOI

10.1016/j.diamond.2016.09.028

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