Electrical and Reliability Characteristics of FinFETs With High-k Gate Stack and Plasma Treatments

Published 2020 View Full Article

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Title
Electrical and Reliability Characteristics of FinFETs With High-k Gate Stack and Plasma Treatments
Authors
Keywords
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Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 68, Issue 1, Pages 4-9
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2020-12-09
DOI
10.1109/ted.2020.3038364

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