Defect profiling in FEFET Si:HfO2 layers

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Intrinsic charge trapping in amorphous oxide films: status and challenges

(2018) Jack Strand et al.   JOURNAL OF PHYSICS-CONDENSED MATTER

Comphy — A compact-physics framework for unified modeling of BTI

(2018) G. Rzepa et al.   MICROELECTRONICS RELIABILITY

Origin of Temperature-Dependent Ferroelectricity in Si-Doped HfO2

(2018) Min Hyuk Park et al.   Advanced Electronic Materials

Intrinsic electron traps in atomic-layer deposited HfO2 insulators

(2016) F. Cerbu et al.   APPLIED PHYSICS LETTERS

Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects

(2015) J. Muller et al.   ECS Journal of Solid State Science and Technology