Paraelectric/antiferroelectric/ferroelectric phase transformation in As-deposited ZrO2 thin films by the TiN capping engineering

Published 2020 View Full Article

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Title
Paraelectric/antiferroelectric/ferroelectric phase transformation in As-deposited ZrO2 thin films by the TiN capping engineering
Authors
Keywords
Antiferroelectricity and ferroelectricity, Atomic layer deposition, Phase transformation, Zirconium oxide and titanium nitride, Capping layer effect
Journal
MATERIALS & DESIGN
Volume 195, Issue -, Pages 109020
Publisher
Elsevier BV
Online
2020-08-04
DOI
10.1016/j.matdes.2020.109020

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