Paraelectric/antiferroelectric/ferroelectric phase transformation in As-deposited ZrO2 thin films by the TiN capping engineering

出版年份 2020 全文链接

标题

作者

关键词

Antiferroelectricity and ferroelectricity, Atomic layer deposition, Phase transformation, Zirconium oxide and titanium nitride, Capping layer effect

出版物

Volume 195, Issue -, Pages 109020

出版商

Elsevier BV

发表日期

2020-08-04

DOI

10.1016/j.matdes.2020.109020

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