Atomic layer deposition of ZnO thin film on ZrO2 dental implant surface for enhanced antibacterial and bioactive performance

ZnO thin film was deposited on ZrO2 plates by Atomic Layer Deposition, and the ZrO2/ZnO plates were annealed at 200 degrees C, 225 degrees C, 250 degrees C and 275 degrees C in Ar environment for 2 h. The characterization results showed that a higher annealing temperature resulted in increased grain size, surface roughness and hydrophilicity. The antibacterial and bioactive properties of ZrO2/ZnO thin-film composite were studied with Streptococcus Sanguinis (SS), Bifidobacterium (BB), and Porphyromonas Gingivalis (PG) bacteria. The ZnO thin film annealed at 250 degrees C exhibited the best biocompatibility and antibacterial performance. (c) 2020 Elsevier B.V. All rights reserved.

Automated summary

The ZnO thin film deposited on ZrO2 plates showed increased grain size, surface roughness, and hydrophilicity with higher annealing temperatures. Among the annealing temperatures tested, the ZnO thin film annealed at 250 degrees C exhibited the best biocompatibility and antibacterial performance.