Multifractal study of TiO2 thin films deposited by MO-CVD method: the role of precursor amount and substrate temperature

Published 2020 View Full Article

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Title
Multifractal study of TiO2 thin films deposited by MO-CVD method: the role of precursor amount and substrate temperature
Authors
Keywords
TiO, 2, thin films, Multifractal, Surface morphology, AFM images, MO-CVD
Journal
OPTIK
Volume -, Issue -, Pages 165384
Publisher
Elsevier BV
Online
2020-08-05
DOI
10.1016/j.ijleo.2020.165384

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